承德MUX400 High-Vacuum Eutectic Furnace

Uncooled infrared detectors, lasers, LED eutectic bonding, RF and microwave technologies, and radar

Category:

承德High Vacuum Furnaces

86 400-673-6773

Product Description

1. Application areas:

Uncooled infrared detectors, lasers, LED eutectic bonding, RF and microwave technologies, radar

2. Equipment Features

*Large-area heating eutectic soldering, meeting the mass production needs of most products

*Customizable to non-standard specifications, designed according to varying heating areas and heights.

*The software interface is simple and easy to use, enabling effortless operation and real-time process analysis; can be integrated with an MES system.

*Temperature is regulated and controlled using PID, enabling automatic thermal management.

*The high-vacuum system’s hermetic sealing and baking process at 400°C can achieve a vacuum level of 10⁻⁵ Pa within one hour (when the optional high-vacuum system is installed).

*All system components in the formic acid process are manufactured to stringent corrosion-resistant standards.

3. Equipment Parameters

Project	Parameters
Equipment dimensions	1260mm1160mm1200mm
Cavity height	80mm
Observation window	Equipped with an observation window at the top.
Equipment weight	Approximately 450 kg
Vacuum pump	Oil-sealed vacuum pump or dry vacuum pump
Process vacuum (low vacuum)	5Pa
Process vacuum (high vacuum)	10⁻⁵ Pa
Process gas	Nitrogen gas, formic acid gas
Heating method	Infrared radiation heating, heating rate ≥ 120°C/min
Cooling method	Water-jacket cooling and N2, heating rate ≥120°C/min
Heating area	420mm*320mm
Temperature range	Room temperature to 450°C
Temperature control accuracy	±1℃
Hot plate uniformity	±2.5℃%
Detection Channel	4 channels (multiple channels optional)
Power Requirements	380 V, 50 Hz, power ≤ 30 kW
Standard Configuration	Vacuum pump, chiller, and gas delivery system
Optional addition device	Positive-pressure system, high-vacuum system, flux recovery system, vision system