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Multi-Chamber Vacuum Welding Degassing Furnace EVD440

Continuous operation of infrared detectors: degassing, wafer baking, and drying.

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1. Application areas:

Continuous operation of infrared detectors: degassing, wafer baking, and drying.

2. Equipment Features

*The entire machine features four chambers that can operate simultaneously or independently, offering both high- and low-temperature degassing as well as vacuum sealing and soldering.

*Customizable automated rail-guided hatch opening, front-to-back transfer, and automatic opening and closing of front and rear doors

*Large-scale operations, enabling batch and continuous production

*Uniform temperature distribution and rapid, precise heating and cooling rate control, with vacuum pumping, nitrogen purging, and water-cooling capabilities.

*Real-time monitoring of multiple critical parameters within the cabin, including temperature, pressure, and vacuum level.

3. Equipment Parameters

Project

Parameters

Equipment dimensions

1800mm*1160mm*1900mm

Lumen height

100mmmm

Observation window

Observation window provided at the front of the chamber

Weight

950 kg

Vacuum pump

Dry vacuum pump

Process vacuum

10 Pa

Process gas

Nitrogen

Heating method

Infrared radiation heating, heating rate ≥90°C/min

Cooling method

Water-jacket cooling and N2, heating rate ≥90°C/min

Heating area (single chamber)

400mm*350mm

Heating area (four chambers)

(400mm*350mm)*4

Temperature control accuracy

±1℃

Hot plate uniformity

±2.5℃%

Detection Channel

8 channels (multiple channels optional)

Power Requirements

380 V, 50 Hz, power ≤ 70 kW

Standard Configuration

Vacuum pump, chiller, curve control

Optional addition device

High-vacuum system, automated transfer


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